Ultrahigh vacuum creation is almost commonplace in the world of scientific research and vacuums of all values are found almost everywhere in everyday life. However, the creation and use of the vacuum did not happen in isolation, neither did it happen overnight.
As far back as 1927, scientists Davison and Germer were working on low energy electron diffraction. The work would win them a Nobel prize, but more importantly the chamber conditions they worked under were most likely ultra high vacuum. There is no way to know for sure because the instrumentation needed to measure such low pressures didn’t exist at the time. It first became possible to measure such pressures in 1955. This was made possible by the development of the Bayard Alpert gauge. This gauge provided much better information about the pressure conditions within a vacuum. Further work on UHV systems and conditions was pushed forward in the 1960s by a growing interest in the scientific community in the properties of surfaces. Around the same time came the birth of the semiconductor manufacturing industry. Along with the more established nuclear physics sector, there was a growth in the need for clean surfaces. These needed to be free from hydrocarbon contamination and provide a chamber surface that was free from an adsorbed gas layer for a predetermined, and useful, period of time. Along with the space technology industry, these continue to be some of the main scientific and industrial leaders in the use of ultra high vacuum systems and components for a range of applications.
An ultrahigh vacuum system or component is only as useful as it is designed and developed to be. When you purchase your products and accessories from Arun Microelectronics Limited, you are assured of only the best quality. As well as selling, we offer servicing and repair to keep your business going. Find out more about our full range of services at http://arunmicro.com/.