Design of vacuum pump technology differs depending on the type of pump that is being considered. One of the most common pumps used to create ultra high vacuums is an ion pump. The ion pump and its components are ideal for creating ultra high vacuum environments, but are not without their difficulties.
An ion pump can pump to approximately 5E-10 mbar. It can achieve lower pressures below E-10 mbar if used alongside a titanium sublimation pump. One of the reasons why the ion pump is ideal for UHV design environments is that it has no working fluids or moving parts. As a consequence, there is no process gas load. However, an ion pump is not without difficulties, one of which is selective pumping. Pumping in an ion pump happens through a process of gettering of chemically active gases and the burial of inert gases. This occurs at lower pumping speed, and therefore inert gases are likely to develop into a residual gas in the background, making UHV difficult to achieve. A further concern relates to memory effects. Such effects are typical of ion pumps and affect the remaining gas structure. The gas ions that are buried in the cathodes early in the life-cycle are freed by later sputtering. Ion pumps also have no ability to tolerate gas load and their magnetic fields are known to interfere with processes unless suitably screened. An ion pump can be operated with sorption pumps at the start. This aids in producing a fully contamination-free system.
At Arun Microelectronics Limited, we have all the components and accessories you need to get the right design of vacuum pump for your needs. From motors to ion gauges and control systems, you will find everything at http://arunmicro.com/. For servicing, support and information on warranties, call the team on +44 (0) 1903 884141.